- The electron beam evaporation source is a type of vacuum coating equipment. It uses a magnetic field to focus a high-energy electron beam to bombard the film material inside a water-cooled copper crucible, causing the material to partially vaporize (with a temperature reaching over 3000℃). The vapor then deposits on the substrate surface to form a film.
- Main application fields
- - Metallurgical industry
- - Chemical field
- - Mechanical manufacturing
- - Electronic technology
- Product Features
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- ● The RK DZQ270-1A type electron gun is an open-type electron gun, which can be used with any acupuncture crucible;
- ● It adopts a 270-degree internal filament design, effectively avoiding the contamination of molten material on the filament and prolonging the filament's lifespan;
- ● It is equipped with a dedicated water-cooling structure to cool and protect the permanent magnet, ensuring the stable operation of the beam for a long time;
- ● The maintenance is simple and convenient, and it is equipped with a special tool for replacing the filament.
Technical Parameters
● Acceleration voltage: -6KV to -10KV
● Electron beam current: 1A
● Maximum power: 10KW
● Electron beam deflection angle: 270°
● Electron beam scanning range: 15mm×15mm (X/Y)
● Cooling water flow rate: Maximum speed 8L/minute (water temperature between 15℃ and 25℃, pressure difference not less than 0.1MPa, maximum pressure not higher than 0.3MPa)
● Air tightness: Leakage rate not higher than 1.33×10-5Pa.L/S
● Working vacuum range: 5×10-4Pa to 5×10-2Pa
● Dimensions: W148×H158×D184 (mm)
● Weight: Approximately 10Kg
