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Series JC Magnetron Sputtering Coater
  • Uses and features
  • Specification parameter
    Use and Features
     
    ●Magnetron sputtering coater is mainly used in substrate-based coating of metal, semiconductor, dielectric, multi-element compound or mixture. Sputtering is an applicable method for preparation of metal film, semi-conductor film, insulating film, hard film, heat-resisting film, corrosion-resistant film, super-conduct film, magnetic film, optical film and other films with special performance.
    ●Magnetron sputtering coating is popularly used for its wide range of coating, good controllability, high repeatability and filming density, strong adhesion and low temperature rise in the substrate as well as other features.
    JC系列磁控溅射镀膜机
    Series JC Magnetron Sputtering Coater
     
    主要机型及参数
    Main models and parameters
    型号
    Model
    应用特点
    Application field
    装片工作台特点
    Features of film loading bench
    基片尺寸
    Size of substrate
    产量/每小时
    1μ铝层厚度
    Output per hour 1μm aluminum coating thickness
    厚度
    均匀性
    thickness homogeneity
    真空系统
    Vacuum system
    JC400-1/D 适合科研、生产硅片及砷化镓片
    Scientific research,production of silicon film and gallium arsenide film
    全自动盒对盒送片,溅射源数量可按工艺调整,低尘粒
    Full automatic box-to-box film advance;quantity of sputtering source to be adiusted as per the process;low in density of dust particles
    4~6″ 40 ±5% 低温泵加
    分子泵系统
    Cryogenic pump system added with molecular pump
    JC500-1/D 适用于圆形片状工件
    Circular sheet work-piece
    工件可进行公转,水平装片
    Revolution of work-piece available;horizontal film loading
    4″ 16 ±8% 分子泵系统
    Turbomolecular pump system
    JC500-5/D 适用于矩形片状工件
    Rectangular sheet work-piecevv
    工件可进行公转,垂直装片
    Revolution of work-piece available;vertical film loading
    150x150mm 10 ±8% 分子泵系统
    Turbomolecular pump system
    JC600-1/D 适用于矩形片状工件
    Rectangular sheet work-piecevv
    工件架为十边拄形,垂直装片
    work-piece holder in decagonal column shape;vertical film loading
    280x100mm 20 ±8% 扩散泵系统
    Diffusion pump system
    JC600-2/D 适合科研、生产砷化镓基片线宽亚微米级
    Scientific research,production of gallium arsenide film with line width at submicron level
    工件可进行自传、公转
    水平装片
    Rotation and revolution of work-piece available;horizontal film loading
    3″ 24 ±5% 低温泵系统
    Cryogenic pump system
    JC650-1/D 适用于矩形或圆形片状工件
    Rectangular or circular sheet work-piece
    工件可进行公转,水平装片
    revolution of work-piece available;horizontal film loading
    Φ100mm 10 ±5% 分子泵系统
    Turbomolecular pump system